Exposure apparatus, exposure method, and device...

Details Exposure apparatus, exposure method, and device... Exposure apparatus, exposure method, and device...

2006-05-23

2006-05-23

Kim, Peter B. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S055000, C355S077000

Reexamination Certificate

active

07050151

ABSTRACT:
To provide an exposure apparatus with which a wafer surface to be exposed can be aligned with a best imaging plane with respect to a reduced focal depth and a high resolution can be attained. The exposure apparatus for exposing a pattern formed on a reticle to an object to be exposed includes: a detecting unit for measuring a position of the object to be exposed at a plurality of first measurement positions that meet a predetermined relative positional relationship in an exposure region of the object to be exposed to which the pattern is exposed and for measuring a position of the object to be exposed at a plurality of second measurement positions that meet the predetermined relative positional relationship in regions outside the exposure region; and a control unit for controlling at least one of a position, a height, and a tilt of the object to be exposed based on information on the position of the object to be exposed which is measured by the detecting unit.

REFERENCES:
patent: 5448332 (1995-09-01), Sakakibara et al.
patent: 5750294 (1998-05-01), Hasegawa et al.
patent: 6476904 (2002-11-01), Kubo
patent: 2003/0193655 (2003-10-01), Ina
patent: 6-260391 (1994-09-01), None
patent: 6-283403 (1994-10-01), None
patent: 9-45609 (1997-02-01), None
patent: 2003-70196 (2003-03-01), None

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