Photocopying – Projection printing and copying cameras – Plural
Reexamination Certificate
2011-03-29
2011-03-29
Nguyen, Hung Henry (Department: 2882)
Photocopying
Projection printing and copying cameras
Plural
C355S053000, C355S067000, C355S072000
Reexamination Certificate
active
07916270
ABSTRACT:
An exposure apparatus includes a projection optical system that has a first object field area and a second object field area different from the first object field area and that projects an image of a pattern onto a first image field and a second image field. The image of the pattern is formed in the first image field by exposure light via the first object field area, and the image of the pattern is formed in the second image field by exposure light via the second object field area. A first substrate is exposed with the image of the pattern formed in the first image field, and a second substrate is exposed with the image of the pattern formed in the second image field.
REFERENCES:
patent: 4653903 (1987-03-01), Torigoe et al.
patent: 6208407 (2001-03-01), Loopstra
patent: 6238852 (2001-05-01), Klosner
patent: 6400441 (2002-06-01), Nishi et al.
patent: 6608681 (2003-08-01), Tanaka et al.
patent: 6611316 (2003-08-01), Sewell
patent: 6778257 (2004-08-01), Bleeker et al.
patent: 6819405 (2004-11-01), Mulkens et al.
patent: 6897963 (2005-05-01), Taniguchi et al.
patent: 2002/0123012 (2002-09-01), Sewell
patent: 2003/0218730 (2003-11-01), Murakami et al.
patent: 2004/0041104 (2004-03-01), Liebregts et al.
patent: 2005/0213070 (2005-09-01), Scharnweber
patent: 2005/0248856 (2005-11-01), Omura et al.
patent: 2007/0013890 (2007-01-01), Loopstra et al.
patent: A-61-161718 (1986-07-01), None
patent: A-06-120108 (1994-04-01), None
patent: A-07-161603 (1995-06-01), None
patent: A-08-313842 (1996-11-01), None
patent: A-11-135400 (1999-05-01), None
patent: A-2000-21742 (2000-01-01), None
patent: A-2000-164504 (2000-06-01), None
patent: A-2000-323404 (2000-11-01), None
patent: A-2001-513267 (2001-08-01), None
patent: A-2001-291654 (2001-10-01), None
patent: A-2001-297976 (2001-10-01), None
patent: A-2004-519850 (2004-07-01), None
patent: A-2004-304135 (2004-10-01), None
patent: A-2005-268781 (2005-09-01), None
patent: WO 99/23692 (1999-05-01), None
patent: WO 99/27569 (1999-06-01), None
patent: WO 99/49504 (1999-09-01), None
patent: WO 02/069049 (2002-09-01), None
patent: WO 2004/019128 (2004-03-01), None
patent: WO 2005/059617 (2005-06-01), None
patent: WO 2005/059618 (2005-06-01), None
International Search Report issued in International Application No. PCT/JP2007/054028 mailed on May 29, 2007 (w/English Translation).
Written Opinion of the International Searching Authority issued in International Application No. PCT/JP2007/054028 mailed on May 29, 2007 (w/English Translation).
Kreutzer Colin
Nguyen Hung Henry
Nikon Corporation
Oliff & Berridg,e PLC
LandOfFree
Exposure apparatus, exposure method, and device... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Exposure apparatus, exposure method, and device..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus, exposure method, and device... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2734331