Exposure apparatus employing a photomask

Details Exposure apparatus employing a photomask Exposure apparatus employing a photomask

1993-05-27

1995-02-28

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

355 53, 355 69, 356401, G03F 900

Patent

active

053936230

ABSTRACT:
A reflection photomask includes a substrate and first and second reflection circuit patterns on the substrate so that light reflected from the first reflection circuit pattern has a different phase from light reflected from the second reflection circuit pattern. Interference between the reflected light bundles produces dark, i.e., non-illuminated, regions. An exposure apparatus includes a light source, a Koehler illumination optical system for irradiating a reflection photomask including a circuit pattern with light emitted from the light source, and a projection optical system for converging the light reflected from the reflection photomask onto a substrate to project the circuit pattern onto the substrate.

REFERENCES:
patent: 5279911 (1994-01-01), Kamon et al.

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