Exposure apparatus, cooling method, and device manufacturing...

Details Exposure apparatus, cooling method, and device manufacturing... Exposure apparatus, cooling method, and device manufacturing...

2007-11-13

2007-11-13

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000

Reexamination Certificate

active

10779034

ABSTRACT:
Disclosed herein are an exposure apparatus and a cooling method usable therein, being effective to improve a mirror temperature-control precision and to suppress temperature changes in a certain allowable range, particularly in an EUV exposure apparatus. The exposure apparatus includes a chamber having an inside space filled with a vacuum ambience, a subject member disposed in the inside space, the subject member being a member to be temperature-adjusted, a radiation member for temperature-adjusting the subject member without contact thereto, and a temperature adjusting mechanism for temperature-adjusting the subject member, wherein the temperature adjusting mechanism changes the temperature of the radiation member before a heat quantity applied or to be applied to the subject member changes.

REFERENCES:
patent: 5638687 (1997-06-01), Mizohata et al.
patent: 6098408 (2000-08-01), Levinson et al.
patent: 6226073 (2001-05-01), Emoto
patent: 2001/0001248 (2001-05-01), Emoto
patent: 2001/0038446 (2001-11-01), Takahashi
patent: 2002/0027000 (2002-03-01), Nishimura
patent: 2002/0027644 (2002-03-01), Bisschops
patent: 1286221 (2003-02-01), None
patent: 1353232 (2003-10-01), None
patent: 1387054 (2004-02-01), None
patent: 09092613 (1997-04-01), None
patent: A 9-92613 (1997-04-01), None
European Search Report, Feb. 23, 2005.

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