Exposure apparatus, control method for the same, and device...

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

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Details

C355S030000, C355S053000, C355S077000, C359S359000

Reexamination Certificate

active

08004657

ABSTRACT:
An exposure apparatus that includes a chamber in which an optical element, including a capping layer, is arranged, and that exposes a substrate to exposure light via the optical element. The apparatus includes a supply unit configured to supply a material into the chamber and a providing unit configured to provide electromagnetic waves to the capping layer. The apparatus is configured so that the electromagnetic waves provided by the providing unit cause a photochemical reaction of the material, to grow a layer on the capping layer, with at least one of a condition of supply of the material by the supply unit and a condition of provision of the electromagnetic waves by the providing unit being changed in accordance with each position of the capping layer, based on information of a decrease in an amount of the capping layer at each position, so as to repair the capping layer.

REFERENCES:
patent: 5429730 (1995-07-01), Nakamura et al.
patent: 5835560 (1998-11-01), Amemiya et al.
patent: 6449086 (2002-09-01), Singh
patent: 6533952 (2003-03-01), Klebanoff et al.
patent: 6721032 (2004-04-01), Hasegawa et al.
patent: 6724462 (2004-04-01), Singh et al.
patent: 6738188 (2004-05-01), Singh
patent: 6750946 (2004-06-01), Tanaka et al.
patent: 6867843 (2005-03-01), Ogushi et al.
patent: 6954255 (2005-10-01), Hasegawa et al.
patent: 2002/0051124 (2002-05-01), Banine et al.
patent: 2005/0109278 (2005-05-01), Liang et al.
patent: 2007/0040999 (2007-02-01), Wilhelmus Van Herpen et al.
patent: 2007/0097342 (2007-05-01), Gomei et al.
patent: 2007/0202423 (2007-08-01), Tanabe et al.
patent: 2001-059901 (2001-03-01), None

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