Exposure apparatus configured to minimize effects of...

Details Exposure apparatus configured to minimize effects of... Exposure apparatus configured to minimize effects of...

2007-12-05

2010-06-15

Lee, Hwa S. A (Department: 2886)

Optics: measuring and testing

By light interference

For dimensional measurement

Reexamination Certificate

active

07738114

ABSTRACT:
An exposure apparatus includes a stage configured to hold an original thereon and to move in a horizontal direction, a first interferometer configured to emit first measurement light used for measuring a position of the stage in a vertical direction thereof, a first mirror provided on a bottom surface of the stage, and a second mirror provided directly below the first mirror. The second mirror is disposed so as to guide the first measurement light emitted from the first interferometer to the first mirror.

REFERENCES:
patent: 6819433 (2004-11-01), Takai
patent: 6867849 (2005-03-01), Iwamoto
patent: 2001-345254 (2001-12-01), None

Affiliated with

Also associated with

Rating

Exposure apparatus configured to minimize effects of... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus configured to minimize effects of..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus configured to minimize effects of... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4202442