Exposure apparatus capable of asymmetrically adjusting light...

Details Exposure apparatus capable of asymmetrically adjusting light... Exposure apparatus capable of asymmetrically adjusting light...

2007-12-13

2011-10-25

Nguyen, Hung Henry (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S067000

Reexamination Certificate

active

08045139

ABSTRACT:
An exposure apparatus of a semiconductor device may include an exposure light source; an asymmetric adjustment filter for asymmetrically adjusting intensity of a light which passes through the exposure light source; a photomask for passing the light of which intensity is adjusted by the asymmetric adjustment filter; a projection lens for projecting the light passing through the photomask; and a wafer stage for mounting a wafer on which an image is formed by the light from the projection lens.

REFERENCES:
patent: 7262831 (2007-08-01), Akhssay et al.
patent: 7275408 (2007-10-01), Balasubramaniam et al.
patent: 2004/0174512 (2004-09-01), Toyoda et al.
patent: 2005/0062949 (2005-03-01), Irie
patent: 2009/0323043 (2009-12-01), Dieckmann et al.
patent: 10-2001-0090252 (2001-10-01), None
patent: 10-2006-0086496 (2006-08-01), None
Van Schoot et al, “CD Uniformity Improvement by Active Scanner Corrections”. Proceedings of SPIE, vol. 4691, p. 304-314.
Van Schoot et al: Etch, Reticle, and Track CD Fingerprint Corrections with Local Dose Compensation; Proceedings of SPIE vol. 5755, pp. 107-118.

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