Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Mechanical measurement system
Reexamination Certificate
2006-07-04
2006-07-04
Nghiem, Michael (Department: 2863)
Data processing: measuring, calibrating, or testing
Measurement system in a specific environment
Mechanical measurement system
C702S079000, C702S109000, C702S110000, C702S111000
Reexamination Certificate
active
07072777
ABSTRACT:
An exposure apparatus includes a motion control system, the motion control system including a structure, a plurality of actuators to apply forces to the structure, respectively, and a plurality of sensors to sense motion states of the structure, respectively. The apparatus includes a pseudo-random signal generator to generate a plurality of pseudo-random signals and to apply the plurality of pseudo-random signals to the plurality of actuators, the plurality of pseudo-random signals being equal in number to a number of degrees of freedom of the motion control system, a storage unit to store a first plurality of time-series data obtained by the plurality of sensors with a second plurality of time-series data corresponding to the plurality of pseudo-random signals, and a characteristic deriving unit to derive a characteristic of the motion control system based on the first and second plurality of time-series data.
REFERENCES:
patent: 3742391 (1973-06-01), Smith
patent: 4654808 (1987-03-01), Potter et al.
patent: 5568032 (1996-10-01), Wakui
patent: 5572440 (1996-11-01), Harashima et al.
patent: 5653317 (1997-08-01), Wakui
patent: 6128552 (2000-10-01), Iwai et al.
Horowitz and Hill, “The Art of Electronics”, Cambridge University Press, 1989, pp. 655-660.
Adachi, et al., “A Comparative Study of Prediction Error Method and Subspac Method Using ETS-VI On-Orbit System Indentification Experimental Data”, Transactions Institute of Measurement Automatic Control, vol. 33, No. 8, pp. 805-811 (1997).
Adachi Shuichi
Kato Hiroaki
Mayama Takehiko
Wakui Shinji
Canon Kabushiki Kaisha
Cherry Stephen J.
Fitzpatrick ,Cella, Harper & Scinto
Nghiem Michael
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