Exposure apparatus anti-vibration apparatus, system...

Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Mechanical measurement system

Reexamination Certificate

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C702S079000, C702S109000, C702S110000, C702S111000

Reexamination Certificate

active

07072777

ABSTRACT:
An exposure apparatus includes a motion control system, the motion control system including a structure, a plurality of actuators to apply forces to the structure, respectively, and a plurality of sensors to sense motion states of the structure, respectively. The apparatus includes a pseudo-random signal generator to generate a plurality of pseudo-random signals and to apply the plurality of pseudo-random signals to the plurality of actuators, the plurality of pseudo-random signals being equal in number to a number of degrees of freedom of the motion control system, a storage unit to store a first plurality of time-series data obtained by the plurality of sensors with a second plurality of time-series data corresponding to the plurality of pseudo-random signals, and a characteristic deriving unit to derive a characteristic of the motion control system based on the first and second plurality of time-series data.

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Adachi, et al., “A Comparative Study of Prediction Error Method and Subspac Method Using ETS-VI On-Orbit System Indentification Experimental Data”, Transactions Institute of Measurement Automatic Control, vol. 33, No. 8, pp. 805-811 (1997).

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