Exposure apparatus and reflection type mask to be used in the sa

Details Exposure apparatus and reflection type mask to be used in the sa Exposure apparatus and reflection type mask to be used in the sa

1995-02-24

1996-08-27

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430321, 430322, 378 34, 378 35, G03F 900

Patent

active

055499945

ABSTRACT:
A reflection type mask includes a reflective portion having a multilayered film, a non-reflective portion having an absorbing material and being formed on the multilayered film, and a non-reflective portion being defined by destroying the multilayered film.

REFERENCES:
patent: 5012500 (1991-04-01), Watanabe et al.
patent: 5052033 (1991-09-01), Ikeda et al.
patent: 5272744 (1993-12-01), Itou et al.
patent: 5335259 (1994-08-01), Hayashida et al.
patent: 5399448 (1995-03-01), Nagata et al.
A. M. Hawryluk, et al., "Reflection Mask Defect Repair," Applied Optics, vol. 32, No. 34, Dec. 1993, pp. 7012-7015.
Patent Abstracts Of Japan, Kokai No. 4-346-214. vol. 17, No. 203, Apr. 1993.
Patent Abstracts Of Japan, Kokai No. 5-088-355, vol. 17, No. 428, Aug. 1993 .

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