Exposure apparatus and purging method for the same

Details Exposure apparatus and purging method for the same Exposure apparatus and purging method for the same

2006-04-18

2006-04-18

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C250S492200

Reexamination Certificate

active

07030960

ABSTRACT:
Disclosed is an exposure apparatus including an exposure light source, an optical system, a casing, a gas replacing system, and a control system. The optical system directs exposure light from the exposure light source to a photosensitive substrate. The casing accommodates therein at least one optical element of the optical system. The gas replacing system supplies a purge gas into the casing to replace a gas inside the casing with the purge gas. The control system controls the gas replacing system so as to increase a flow rate of the purge gas if a predetermined time elapses after an exposure is completed and before a next exposure starts.

REFERENCES:
patent: 2002/0000519 (2002-01-01), Tsukamoto
patent: 2002/0057422 (2002-05-01), Arakawa
patent: 2-210813 (1990-08-01), None
patent: 6-216000 (1994-08-01), None

Affiliated with

Also associated with

Rating

Exposure apparatus and purging method for the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus and purging method for the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus and purging method for the same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3542706