Exposure apparatus and optical component for the same

Details Exposure apparatus and optical component for the same Exposure apparatus and optical component for the same

2006-07-04

2006-07-04

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000

Reexamination Certificate

active

07072026

ABSTRACT:
In an exposure apparatus, an exposure object is exposed to light by applying pulsed light that has a wavelength of 300 nm or less and that has been passed through a plurality of optical components. At least one of the plurality of optical components is made of a synthetic silica glass component. The thickness of the synthetic silica glass component, and the energy density per pulse and the pulse width of the pulsed light satisfy the following expression:in-line-formulae description="In-line Formulae" end="lead"?τI−2L−1.7≧0.02 (ns·mJ−2·cm2.3·pulse2)in-line-formulae description="In-line Formulae" end="tail"?wherein L is the thickness (unit: cm) of the synthetic silica glass component, I is the energy density (unit: mJ·cm−2·pulse−1) per pulse, and τ is the pulse width (unit: ns).

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