Photocopying – Projection printing and copying cameras – Illumination systems or details
Patent
1996-01-04
1997-12-16
Grimley, Arthur T.
Photocopying
Projection printing and copying cameras
Illumination systems or details
355 67, 355 69, 396111, G01D 942, G03B 2754, G03B 2772
Patent
active
056991487
ABSTRACT:
A scanning exposure apparatus and method wherein an original and a substrate are moved relative to an illumination region to which pulse light is projected. The apparatus includes a light source for successively emitting pulse light, an optical integrator for receiving the pulse light from the light source, a masking blade having an opening for being projected onto the original in a defocused state, wherein the pulse light from the optical integrator is projected to the illumination region through the opening of the masking blade, and the opening of the masking blade, as projected onto the original in the defocused state, defines on the illumination region a light intensity distribution having a trapezoidal shape with respect to the direction of movement of the original, and a movement controller for controlling movement of the original and the substrate so that the substrate is exposed to the original with the pulse light from the illumination region, during a period in which pulse light, successively emitted by the light source, is projected onto the illumination region.
REFERENCES:
patent: 3823318 (1974-07-01), Krause
patent: 4519692 (1985-05-01), Michalik
patent: 4711568 (1987-12-01), Torigoe et al.
patent: 4804978 (1989-02-01), Tracy
patent: 4822975 (1989-04-01), Torigoe
patent: 4884101 (1989-11-01), Tanimoto
patent: 4947047 (1990-08-01), Muraki
patent: 4970546 (1990-11-01), Suzuki et al.
patent: 4974919 (1990-12-01), Muraki et al.
patent: 5053614 (1991-10-01), Yui et al.
patent: 5107275 (1992-04-01), Tsuruoka et al.
patent: 5119390 (1992-06-01), Ohmori
patent: 5171965 (1992-12-01), Suzuki et al.
patent: 5191374 (1993-03-01), Hazama et al.
patent: 5194893 (1993-03-01), Nishi
patent: 5250797 (1993-10-01), Sano et al.
Canon Kabushiki Kaisha
Grimley Arthur T.
Kerner Herbert V.
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