Exposure apparatus and method that use mark patterns to determin

Details Exposure apparatus and method that use mark patterns to determin Exposure apparatus and method that use mark patterns to determin

1996-08-02

1998-11-24

Moses, R. L.

Photocopying

Projection printing and copying cameras

Step and repeat

2502011, 2505593, G03B 2742, G01N 2186

Patent

active

058415203

ABSTRACT:
A scanning type exposure apparatus comprises a mask stage RST for scanning a mask R across an illumination area on the mask R, a projection optical system PL for projecting an image of a pattern on the mask R onto a photosensitive substrate W, and a substrate stage WST for scanning the photosensitive substrate W across an exposure area. The apparatus comprises an image pickup unit 53 having its light-receiving section 1 provided on the substrate stage WST, for photoelectrically detecting an image of a mark pattern on the mask R, and a combining unit 4 for combining signals outputted from the image pickup unit 53 during a period in which the light-receiving section is scanned across the exposure area in synchronization with scanning for the mark pattern across the illumination area. Image formation characteristics or a position of the image of the mark pattern is determined on the basis of an output of the combining unit 4, which may be corrected before actual exposure. Correction is also performed by using synchronization errors. It is also possible to use an edge scan type sensor in place of the image pickup unit 53.

REFERENCES:
patent: 4629313 (1986-12-01), Tanimoto
patent: 4897553 (1990-01-01), Nishi
patent: 4952815 (1990-08-01), Nishi
patent: 5241188 (1993-08-01), Mizutani
patent: 5424552 (1995-06-01), Tsuji et al.
patent: 5552892 (1996-09-01), Nagayama
patent: 5585925 (1996-12-01), Sato et al.
patent: 5650840 (1997-07-01), Taniguchi

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