Optics: measuring and testing – By polarized light examination – With birefringent element
Patent
1996-10-11
1999-10-05
Kim, Robert H.
Optics: measuring and testing
By polarized light examination
With birefringent element
356358, 356361, 356401, G01B 902
Patent
active
059633247
ABSTRACT:
An exposure apparatus is provided with temperature sensors (25 and 26) to measure temperatures of air around laser beams from a reticle-side laser interferometer (22a) and a wafer-side laser interferometer (23a), together with an environmental sensor (31) for measuring an atmospheric pressure, humidity, and so forth. A main control system (13) as a host CPU instructs a reticle stage control system (27) and a wafer stage control system (28) to move a reticle and a wafer, respectively (step 201). During the reticle and wafer moving period, measured values by the temperature sensors (25 and 26) and the environmental sensor (31) are read, and a variation of the laser wavelength due to a change in the environmental data is corrected (step 202), and during subsequent scanning exposure, position control of the reticle and wafer stages is effected by using the corrected laser wavelength. Thus, the laser wavelength of the laser interferometers is corrected without an increase in the cost or a reduction of the throughput.
REFERENCES:
patent: 5483343 (1996-01-01), Iwamoto et al.
Kim Robert H.
Nikon Corporation
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