Exposure apparatus and method of manufacturing device

Details Exposure apparatus and method of manufacturing device Exposure apparatus and method of manufacturing device

2008-06-24

2009-11-03

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000

Reexamination Certificate

active

07612868

ABSTRACT:
An exposure apparatus which exposes a substrate to pulsed light supplied from a light source, includes an input device, and a controller configured to periodically change a wavelength of the pulsed light emitted by the light source, wherein the controller is configured to calculate number of pulsed light required to expose each point on the substrate based on a parameter input from the input device, and configured to determine a changing period of the wavelength based on the calculated number.

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