Exposure apparatus and method having a measuring unit for measur

Details Exposure apparatus and method having a measuring unit for measur Exposure apparatus and method having a measuring unit for measur

1994-09-12

1996-03-26

Westin, Edward P.

Radiant energy

Photocells; circuits and apparatus

With circuit for evaluating a web, strand, strip, or sheet

250548, 2502012, 355 53, 356401, G01N 2186

Patent

active

055023134

ABSTRACT:
An exposure apparatus includes a projection optical system for projecting a pattern on a mask onto a photosensitive substrate and a measuring unit for measuring distances between the mask and the projection optical system at a plurality of positions within a surface of the mask. The position of the photosensitive substrate with respect to the projection optical system is changed on the basis of a plurality of the distances measured by the measuring unit.

REFERENCES:
patent: 5155370 (1992-10-01), Osawa et al.
patent: 5166754 (1992-11-01), Suzuki et al.

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