Exposure apparatus and method for producing device

Details Exposure apparatus and method for producing device Exposure apparatus and method for producing device

2006-10-25

2010-10-19

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000, C355S055000

Reexamination Certificate

active

07817244

ABSTRACT:
An exposure apparatus performs exposure for a substrate by filling a space between a projection optical system and the substrate with a liquid and projecting an image of a pattern onto the substrate through the liquid by using the projection optical system. The exposure apparatus includes a substrate stage for holding the substrate, a liquid supply unit for supplying the liquid to a side of an image plane of the projection optical system, and a focus/leveling-detecting system for detecting surface information about a surface of the substrate not through the liquid. The exposure apparatus performs liquid immersion exposure for the substrate while adjusting a positional relationship between the surface of the substrate and the image plane formed through the projection optical system and the liquid, on the basis of the surface information detected by the focus/leveling-detecting system. The liquid immersion exposure can be performed at a satisfactory pattern transfer accuracy.

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