Exposure apparatus and method for positioning with a high accura

Details Exposure apparatus and method for positioning with a high accura Exposure apparatus and method for positioning with a high accura

1995-12-26

1998-08-18

Westin, Edward P.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

356400, G01N 2186

Patent

active

057961140

ABSTRACT:
In this exposure apparatus, a grating-like reticle mark formed on the lower surface of a reticle is irradiated with illumination light components RB.sub.1 and RB.sub.2 with an intersecting angle 2.theta. from two directions, respectively, such that diffracted light components are emitted in directions which divide the intersecting angle 2.theta. into three pieces. Interference light formed by a +2-order diffracted light component RB.sub.1.sup.+2 of the illumination light component RB.sub.1 and a -1-order diffracted light component RB.sub.2.sup.-1 of the illumination light component RB.sub.2 or interference light formed by a +1-order diffracted light component RB.sub.1.sup.+1 of the illumination light component RB.sub.1 and a -2-order diffracted light component RB.sub.2.sup.-2 of the illumination light component RB.sub.2 is detected.

REFERENCES:
patent: 4984890 (1991-01-01), Tojo et al.
patent: 5204535 (1993-04-01), Mizutani
patent: 5214489 (1993-05-01), Mizutani et al.
patent: 5488230 (1996-01-01), Mizutani et al.

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