Exposure apparatus and method for manufacturing device using...

Details Exposure apparatus and method for manufacturing device using... Exposure apparatus and method for manufacturing device using...

2007-04-24

2007-04-24

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C355S067000

Reexamination Certificate

active

11460354

ABSTRACT:
At least one exemplary embodiment is directed to an exposure apparatus which includes an illumination optical system configured to irradiate a mask with light from a light source, and a projecting optical system configured to project a pattern image of the mask onto a substrate. The illumination optical system provides a first light intensity which can be altered by an optical unit forming a second light intensity. The second light intensity can be further altered by an optical unit changing the dimension of the second light intensity forming a third light intensity, where the third light intensity can be used in the lithographic process for forming devices.

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patent: 6897944 (2005-05-01), Shiozawa
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patent: 7095560 (2006-08-01), Toyoda et al.
patent: 2003/0197847 (2003-10-01), Shinoda
patent: 05-217853 (1993-08-01), None
patent: 11-087232 (1999-03-01), None
patent: 2003-318086 (2003-11-01), None

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