Exposure apparatus and method, and device manufacturing method

Details Exposure apparatus and method, and device manufacturing method Exposure apparatus and method, and device manufacturing method

2007-03-07

2009-08-25

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000

Reexamination Certificate

active

07580115

ABSTRACT:
An exposure apparatus for exposing a substrate by scanning a reticle and the substrate relative to each other includes a projection optical system configured to project a pattern of the reticle onto the substrate, and a field stop configured to define a slit-shaped exposure area, and to change a length of the exposure area in a scanning direction in accordance with a change of a length of the exposure area in a direction orthogonal to the scanning direction.

REFERENCES:
patent: 5473410 (1995-12-01), Nishi
patent: 6411364 (2002-06-01), Suzuki
patent: 6462807 (2002-10-01), Nishi
patent: 6995833 (2006-02-01), Kato et al.
patent: 7064805 (2006-06-01), Nemoto
patent: 2005/0078286 (2005-04-01), Dierichs et al.
patent: 2005-037896 (2005-02-01), None

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