Exposure apparatus and method, and device fabricating method...

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

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Details

C355S053000, C355S077000

Reexamination Certificate

active

07092071

ABSTRACT:
An exposure apparatus includes a projection optical system for exposing and transferring a pattern on a mask onto an object, an illumination optical system for forming a secondary light source surface approximately conjugate with a pupil in the projection optical system, and for illuminating the mask, and a mechanism for making non-uniform at least one of a transmittance distribution from the secondary light source to the object and a light intensity distribution on the secondary light source surface.

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English translation of the Japanese Patent Document 2000-195778.
English translation of Japanese Patent Document 11-087232.
English translation of Japanese Patent Document 11-354424.
English translation of Japanese Patent Document 2000-195778.
English translation of Japanese Patent Document 2001-284236.
English translation of the Office Action from the Patent Office of the People's Republic of China for Appl. No. 031041078 dated Oct. 1, 2004. (3 pages).
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