Exposure apparatus and method

Details Exposure apparatus and method Exposure apparatus and method

1996-08-23

1997-09-30

Malley, Daniel P.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, 359122, 359352, 359386, 359483, G02B 2114

Patent

active

056731035

ABSTRACT:
An exposure apparatus for reducing/projecting a plurality of patterns of a photomask, which are elongated in at least two different directions, onto a substrate through the photomask includes a polarized light source for illuminating the photomask, a polarization control unit for changing the direction of polarization of polarized light from the polarized light source, a slit filter arranged at a position where the polarized light is focused and having a slit-like opening portion elongated in a direction perpendicular to the direction of polarization of the polarized light, the slit filter transmitting polarized light, of the polarized light passing through the photomask, which has the direction of polarization, a unit for changing the direction of the opening portion of the slit filter in synchronism with a change in direction of polarization of polarized light which is made by the polarization control unit, and a unit for illuminating the photomask with the polarized light at each position where the direction of the pattern becomes parallel to the direction of polarization of the polarized light, thereby exposing a pattern, formed on the photomask, onto the substrate at the angle of a direction of polarization perpendicular to an incident plane of light incident on the substrate.

REFERENCES:
patent: 4634240 (1987-01-01), Suzuki et al.
patent: 5420717 (1995-05-01), Tabata

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