Exposure apparatus and method

Details Exposure apparatus and method Exposure apparatus and method

2007-05-01

2008-12-23

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000

Reexamination Certificate

active

07468780

ABSTRACT:
An exposure method including the steps of introducing fluid between a surface of an object to be exposed, and a final surface of a projection optical system, displacing an interface of the fluid arranged between the surface of the object and the final surface of the projection optical system, removing a gas from the fluid having a displaced interface, and projecting a pattern on a mask onto the object via the projection optical system and the fluid.

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Smith, Bruce, et al. “Extreme-NA Water Immersion Lithography for 35-65 nm Technology,” Rochester Institute of Technology, International Symposium on 157 nm Lithography, Sep. 3-6, 2002. pp. 1-15.

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