Exposure apparatus and method

Details Exposure apparatus and method Exposure apparatus and method

2006-10-24

2006-10-24

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C030S071000

Reexamination Certificate

active

07126667

ABSTRACT:
An exposure method immerses, in liquid, a surface of an object to be exposed, and a surface of a projection optical system closest to the object, and projects a repetitive pattern formed on a mask via the projection optical system onto the object. The exposure method may direct exposure light having a wavelength λ through a projection optical system that is at least partially immersed in liquid and has a numerical aperture of no·sin θNAgreater than 0.9 in order to transfer a pattern formed on a mask onto an object to be exposed, wherein nois a refractive index of the liquid, Δn is the fluctuation of the refractive index of the liquid, θNAis the largest angle common to the liquid and a resist material applied to the object to be exposed, and d is a thickness of the liquid in an optical-axis direction of the projection optical system which satisfies d≦(0.03λ) cos θNA/Δn.

REFERENCES:
patent: 3648587 (1972-03-01), Stevens
patent: 4346164 (1982-08-01), Tabarelli et al.
patent: 4480910 (1984-11-01), Takanashi et al.
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 5610683 (1997-03-01), Takahashi
patent: 5673103 (1997-09-01), Inoue et al.
patent: 5715039 (1998-02-01), Fukuda et al.
patent: 6404482 (2002-06-01), Shiraishi
patent: 6788477 (2004-09-01), Lin
patent: 2004/0057036 (2004-03-01), Kawashima et al.
patent: 0 887 708 (1998-12-01), None
patent: 62-065326 (1987-03-01), None
patent: 06-053120 (1994-02-01), None
patent: 06-140306 (1994-05-01), None
patent: 06140304 (1994-05-01), None
patent: 08-316125 (1996-11-01), None
patent: 10-303114 (1998-11-01), None
patent: 10303114 (1998-11-01), None
patent: 10-340846 (1998-12-01), None
patent: 10-245414 (1999-11-01), None
JPO Communication, dated Oct. 11, 2005, including translation (6 pgs.).
KPO Communication, dated Nov. 21, 2005, including translation (4 pgs).

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