Exposure apparatus and method

Details Exposure apparatus and method Exposure apparatus and method

2006-01-31

2006-01-31

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S071000

Reexamination Certificate

active

06992750

ABSTRACT:
An exposure method immerses, in liquid, a surface of an object to be exposed, and a surface of a projection optical system closest to the object, and projects a repetitive pattern formed on a mask via the projection optical system onto the object. The exposure method forms on a pupil of the projection optical system an effective light source that emits, from an axis orthogonal to an optical axis of the projection optical system, light that is parallel to a repetitive direction of the repetitive pattern and has an incident angle θ upon the object, wherein the light includes only s-polarized light in an area of an incident angle θ that satisfies 90°−θNA≦θ≦θNA, where θNAis the largest value of the incident angle θ.

REFERENCES:
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 5673103 (1997-09-01), Inoue et al.
patent: 6404482 (2002-06-01), Shiraishi
patent: 2004/0057036 (2004-03-01), Kawashima et al.
patent: 10-303114 (1998-11-01), None

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