Exposure apparatus and method

Details Exposure apparatus and method Exposure apparatus and method

2006-03-14

2006-03-14

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S067000

Reexamination Certificate

active

07012671

ABSTRACT:
An apparatus and method for projecting a pattern includes a light source for emitting a laser; an illuminating unit which illuminates a mask on which a pattern is formed with the laser emitted from the light source and formed in a particular shape; a holder which holds the mask; an optical lens unit which projects the pattern formed on the mask onto a surface of a substrate by the laser illuminated on the mask; and a table which mounts the substrate and moves in at least one direction.

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Horiuchi, English translation of JP 61-91662, Projection Exposure Apparatus May 9, 1986.

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