Exposure apparatus and method

Details Exposure apparatus and method Exposure apparatus and method

2006-05-16

2006-05-16

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000, C355S071000

Reexamination Certificate

active

07046337

ABSTRACT:
An exposure method that transfers a pattern formed on a mask onto an object to be exposed via a projection optical system that is at least partly immersed in liquid. The exposure method forms on a pupil of the projection optical system an effective light source that emits, from an axis orthogonal to an optical axis of the projection optical system, light that has an incident angle θ upon the object, wherein the light includes only s-polarized light in an area of an incident angle θ that satisfies 90°−θNA≦θ≦θNA, where θNAis the largest value of the incident angle θ.

REFERENCES:
patent: 4346164 (1982-08-01), Tabarelli et al.
patent: 4509852 (1985-04-01), Tabarelli et al.
patent: 5673103 (1997-09-01), Inoue et al.
patent: 5715039 (1998-02-01), Fukuda et al.
patent: 6404482 (2002-06-01), Shiraishi
patent: 2004/0057036 (2004-03-01), Kawashima et al.
patent: 0 887 708 (1998-12-01), None
patent: 06-053120 (1994-02-01), None
patent: 06-140306 (1994-05-01), None
patent: 08-316125 (1996-11-01), None
patent: 10-303114 (1998-11-01), None
patent: 10-340846 (1998-12-01), None
patent: 62-065326 (1987-03-01), None
patent: 10-245414 (1999-11-01), None
JPO Communication, dated Oct. 11, 2005, including translation. (6 pgs.).
KPO Communication, dated Nov. 21, 2005, including translatin (4 pgs.).

Affiliated with

Also associated with

Rating

Exposure apparatus and method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus and method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3524591