Exposure apparatus and method

Photocopying – Projection printing and copying cameras – Focus or magnification control

Reexamination Certificate

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Details

C355S053000

Reexamination Certificate

active

06975384

ABSTRACT:
An exposure method for exposing a pattern formed on a reticle onto an object includes a flatness measurement step for measuring the flatness of the object and storing the information obtained, a position measurement step for measuring positions at plural points on the object, and a changing step for changing at least one of the position and tilt of the object on the basis of the information obtained by the flatness measurement step, and information on the position obtained by the position measurement step.

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A copy of a Taiwanese Patent Office Action dated Mar. 18, 2004 and a corresponding English Translation of the Office Action.
English Abstract and Translation of Japanese Publication No. 09-260252.
English Abstract and Translation of Japanese Publication No. 06-097046.
English Abstract and Translation of Japanese Publication No. 2002-033268.
English Abstract and Translation of Japanese Publication No. 2001-093813.
English Abstract and Translation of Janpanese Publication No. 06-283403.
Office Action dated Apr. 28, 2005 corresponding to Korean Patent Application No. 10-2003-0018095.
English Translation of Office Action dated Apr. 28, 2005 corresponding to Korean Patent Application No. 10-2003-0018095.
Office Action dated Mar. 23, 2005 corresponding to Japanese Patent Application No. 2002-086765.
English Translation of Office Action dated Mar. 23, 2005 corresponding to Japanese Patent Application No. 2002-086765.

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