Exposure apparatus and method

Details Exposure apparatus and method Exposure apparatus and method

2005-09-06

2005-09-06

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Focus or magnification control

C335S052000

Reexamination Certificate

active

06940586

ABSTRACT:
An exposure method for exposing a pattern onto plural portions on an object includes the steps of obtaining first flatness information about the plural portions, specifying a portion among the plural portions, which has flatness information that meets a predetermined condition among the first flatness information, obtaining second flatness information that is more detailed than the first flatness information about the portion specified by the specifying step, and exposing, based on the second flatness information, the portion that has been specified.

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patent: 6813001 (2004-11-01), Fujisawa et al.
patent: 6-260391 (1994-09-01), None
patent: 6-283403 (1994-10-01), None
patent: 9-45609 (1997-02-01), None

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