Exposure apparatus and method

Details Exposure apparatus and method Exposure apparatus and method

2008-06-10

2008-06-10

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S067000

Reexamination Certificate

active

07385672

ABSTRACT:
An exposure apparatus for exposing a pattern of a reticle onto an object to be exposed, via a projection optical system, utilizing exposure light, includes an optical element for determining a shape of an effective light source on a predetermined surface that substantially has a Fourier transformation relationship with the reticle, a detector for detecting the shape of the effective light source and a light intensity on the object, and a corrector for correcting a variance of performance of the projection optical system, and a controller for controlling the corrector based on a detection result of the detector.

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