Exposure apparatus and its control method

Details Exposure apparatus and its control method Exposure apparatus and its control method

1998-06-29

2000-03-28

Westin, Edward P.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

356399, 356395, G01B 1100

Patent

active

060435003

ABSTRACT:
An exposure apparatus, which has a projection optical system, a Z-stage movable in the optical axis direction of the projection optical system, an X-Y stage movable in a planar direction perpendicular to the optical axis direction, and a sensor for measuring the positional relationship between a substrate placed on the Z-stage and a predetermined position in the optical axis direction and/or any tilt of the substrate, sequentially moves and aligns the X-Y stage to change the area to be exposed on the substrate, executes a measurement using the sensor, and exposes while correcting the positional relationship between the substrate and the predetermined position in the optical axis direction and/or any tilt of the substrate in accordance with the measurement result, has a control unit for adjusting the measurement start timing of the sensor in correspondence with a change in area to be exposed on the substrate.

REFERENCES:
patent: 5742397 (1998-04-01), Kim
patent: 5955739 (1999-09-01), Kawashima

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