Exposure apparatus and exposure method for minimizing defocusing

Photocopying – Projection printing and copying cameras – Step and repeat

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

355 55, 250548, H01L 21027

Patent

active

056402279

ABSTRACT:
An exposure apparatus and an exposure method which minimize defocusing of the transferred pattern even with a large-sized mask. When the exposure apparatus is used which transfers the pattern formed on a first substrate through a substantially real-size projection optical system onto a second substrate, the positions of the mask and the substrate are detected, and based on the information on the positions the distance between the mask and the substrate is controlled to be substantially constant. According to the present invention, defocusing of the transferred pattern may be substantially avoided by detecting positions of the mask and the plate by making use of, e.g., an obliquely incident light focus detection optical system, and controlling the distance therebetween to be held constant or at a predetermined distance.

REFERENCES:
patent: 4558949 (1985-12-01), Uehara et al.
patent: 4770531 (1988-09-01), Tanaka et al.
patent: 4952970 (1990-08-01), Suzuki et al.
patent: 5194893 (1993-03-01), Nishi
patent: 5343291 (1994-08-01), Ohwada et al.
patent: 5502311 (1996-03-01), Imai et al.
patent: 5502313 (1996-03-01), Nakamura et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Exposure apparatus and exposure method for minimizing defocusing does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus and exposure method for minimizing defocusing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus and exposure method for minimizing defocusing will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2161694

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.