Exposure apparatus and exposure method, and method of...

Details Exposure apparatus and exposure method, and method of... Exposure apparatus and exposure method, and method of...

2006-07-26

2010-11-23

Glick, Edward J (Department: 2882)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S030000

Reexamination Certificate

active

07839484

ABSTRACT:
This invention provides: an exposure apparatus and exposure method based on a maskless exposure technique which uses a two-dimensional optical modulator, in which maskless exposure technique, the exposure apparatus and exposure method employ a first irradiation source optics for drawing a pattern based on exposure pattern data, and a second irradiation source optics for irradiating an energy ray onto a desired area of space on a region inclusive of a region in which the pattern has been drawn; and a method of manufacturing a wiring Substrate (Board); thus, highly accurate pattern forming based on the exposure pattern data is achieved at high throughput and at low costs.

REFERENCES:
patent: 5229872 (1993-07-01), Mumola
patent: 6437348 (2002-08-01), Spence
patent: 6646274 (2003-11-01), Bleeker
patent: 6841340 (2005-01-01), Tani
patent: 2003/0210383 (2003-11-01), Bjorklund et al.
patent: 2002-182157 (2002-06-01), None
patent: 2003-015077 (2003-01-01), None
patent: 2004-039871 (2004-02-01), None
patent: 2004-085728 (2004-03-01), None
patent: 2004-157219 (2004-06-01), None

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