Exposure apparatus and exposure method, and device...

Details Exposure apparatus and exposure method, and device... Exposure apparatus and exposure method, and device...

2007-07-10

2007-07-10

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000

Reexamination Certificate

active

11110350

ABSTRACT:
Disclosed is an exposure apparatus and method, and a device manufacturing method using the same. An exposure apparatus according to one preferred form of the invention includes an illumination optical system for illuminating an original with light from a light source, and a projection optical system for projecting a pattern of the original onto a substrate, wherein the illumination optical system includes an optical integrator for forming a secondary light source by use of light from the light source and a condenser optical system for directing light from the optical integrator to the original, and wherein the projection optical system includes an optical element such as a lens, made of a glass material of quartz and being disposed adjacent a pupil plane of the projection optical system.

REFERENCES:
patent: 6243206 (2001-06-01), Wangler
patent: 6310679 (2001-10-01), Shiraishi
patent: 6414743 (2002-07-01), Nishi et al.
patent: 6583937 (2003-06-01), Wangler et al.
patent: 6913373 (2005-07-01), Tanaka et al.
patent: 7068352 (2006-06-01), Irie
patent: 7126757 (2006-10-01), Mori
patent: 2003/0053036 (2003-03-01), Fujishima
patent: 100 62 579 (2001-06-01), None
patent: 9-6011 (1997-01-01), None
patent: 9-7941 (1997-01-01), None
patent: 10-22217 (1998-01-01), None
patent: 10-270351 (1998-10-01), None
European Search Report from a corresponding European Application No. 05252428.7, dated Apr. 20, 2007.

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