Exposure apparatus and exposure method

Details Exposure apparatus and exposure method Exposure apparatus and exposure method

2008-08-29

2011-11-22

Lyons, Michael A (Department: 2877)

Optics: measuring and testing

By light interference

For dimensional measurement

C355S053000

Reexamination Certificate

active

08064067

ABSTRACT:
Disclosed is an exposing apparatus which projects an image of a pattern by a projection optical system, comprising a measuring unit having a sensor which measures a positional relationship between the projection optical system and a member which is positioned in relation to the projection optical system, and a first support device which has a first soft structure and which supports the measuring unit in a hanging manner separately from the projection optical system.

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