Exposure apparatus and exposure method

Details Exposure apparatus and exposure method Exposure apparatus and exposure method

2006-03-17

2010-06-08

Epps, Georgia Y (Department: 2878)

Photocopying

Projection printing and copying cameras

Step and repeat

Reexamination Certificate

active

07733462

ABSTRACT:
An exposure apparatus includes a beam providing unit having a first component and second component to provide an exposure beam having pattern information to a substrate W, a measurement unit which measures a relative variation between the first component and the second component, a driving mechanism which drives at least one of the first component and second component, and a compensator which controls the driving mechanism on the basis of the measurement result obtained by the measurement unit so as to reduce the relative variation between the first component and the second component in at least the period during which the pattern is transferred onto the substrate.

REFERENCES:
patent: 5187519 (1993-02-01), Takabayashi et al.
patent: 6359678 (2002-03-01), Ota
patent: 6388733 (2002-05-01), Hayashi
patent: 6473159 (2002-10-01), Wakui et al.
patent: 6727981 (2004-04-01), Taniuchi et al.
patent: 7130016 (2006-10-01), Miyajima
patent: 7154582 (2006-12-01), Ohsaki
patent: 7170587 (2007-01-01), Dierichs et al.
patent: 2001/0026408 (2001-10-01), Tanaka
patent: 2002/0070355 (2002-06-01), Ota
patent: 2002/0171815 (2002-11-01), Matsuyama et al.
patent: 2002/0196421 (2002-12-01), Tanaka et al.
patent: 2003/0156270 (2003-08-01), Hunter
patent: 2003/0169411 (2003-09-01), Ota
patent: 2003/0179354 (2003-09-01), Araki et al.
patent: 2003/0197841 (2003-10-01), Araki et al.
patent: 2004/0083966 (2004-05-01), Takahashi et al.
patent: 2004/0114121 (2004-06-01), Nishi et al.
patent: 2004/0135980 (2004-07-01), Hill
patent: 2004/0156026 (2004-08-01), Kamiya
patent: 2004/0179192 (2004-09-01), Mizuno et al.
patent: 2004/0189964 (2004-09-01), Nijmeijer et al.
patent: 2005/0018162 (2005-01-01), Leenders et al.
patent: 2005/0041233 (2005-02-01), Van Schothorst et al.
patent: 2005/0063288 (2005-03-01), Nawata et al.
patent: 2005/0134818 (2005-06-01), Van Dijsseldonk et al.
patent: 2005/0140947 (2005-06-01), Miyajima
patent: 2005/0168712 (2005-08-01), Miyajima
patent: 2005/0184248 (2005-08-01), Kanazawa et al.
patent: 2005/0225739 (2005-10-01), Hiura
patent: 2005/0231706 (2005-10-01), Yang et al.
patent: 2005/0275815 (2005-12-01), Silverbrook
patent: 2006/0001857 (2006-01-01), Cherala et al.
patent: 2006/0023180 (2006-02-01), Hara
patent: 2006/0033895 (2006-02-01), Singer
patent: 2006/0092392 (2006-05-01), Sumiyoshi et al.
patent: 2007/0273859 (2007-11-01), Komatsuda
patent: 2009/0086178 (2009-04-01), Shibazaki
patent: 2003-158059 (2003-05-01), None
patent: WO 2005031466 (2005-04-01), None

Affiliated with

Also associated with

Rating

Exposure apparatus and exposure method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus and exposure method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus and exposure method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4158225