Exposure apparatus and exposure method

Optics: measuring and testing – By light interference – For dimensional measurement

Reexamination Certificate

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Details

C355S053000

Reexamination Certificate

active

07433050

ABSTRACT:
Disclosed is an exposing apparatus which projects an image of a pattern by a projection optical system, comprising a measuring unit having a sensor which measures a positional relationship between the projection optical system and a member which is positioned in relation to the projection optical system, and a first support device which has a first soft structure and which supports the measuring unit in a hanging manner separately from the projection optical system.

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patent: WO 2006/038952 (2006-04-01), None

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