Exposure apparatus and exposure method

Details Exposure apparatus and exposure method Exposure apparatus and exposure method

2007-11-16

2008-09-16

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S055000

Reexamination Certificate

active

07426016

ABSTRACT:
According to an exposure apparatus and an exposure method in the present invention, based on a focus value and a leveling value in each exposure shot calculated based on measurements by a focus sensor, differential absolute value for respective value are calculated. The differential absolute values for the focus values and leveling vaule are compared with predetermined threshold vaule for the respective differential absolute values. When the differential absolute values exceed the threshold value, it is determined that an exposure abnormality exists. In such case, based at least the number of exposure area where the exposure abnormality is occurred and distribution of the exposure area where the exposure abnormality is occurred on the object to be exposed, a kind of the exposure abnormality is identifed. The detection of the exposure abnormality is assured, and a cause of the abnormality is determined without lowering manufacturing capabilities and increasing in cost.

REFERENCES:
patent: 5502311 (1996-03-01), Imai et al.
patent: 6130751 (2000-10-01), Haginiwa et al.
patent: 6549271 (2003-04-01), Yasuda et al.
patent: 2003-257847 (2003-09-01), None
patent: 2006-093316 (2006-04-01), None

Affiliated with

Also associated with

Rating

Exposure apparatus and exposure method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus and exposure method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus and exposure method will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3979943