Exposure apparatus and exposure method

Details Exposure apparatus and exposure method Exposure apparatus and exposure method

2006-05-02

2006-05-02

Picard, Leo (Department: 2125)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C250S492220

Reexamination Certificate

active

07039487

ABSTRACT:
The present invention provides an exposure technology capable of generating bitmap data with high efficiency, and making compatible higher resolution and higher speed control in exposure using pattern data in a bitmap format. An apparatus implementing the exposure technology comprises: a means for applying a charged particle beam or a light onto a sample, and exposing a desired pattern onto the sample; a data processing means for bitmapping the shape of the pattern, and generating the pattern shape data in the bitmap format; and a means for controlling the application of the charged beam or light onto the sample using the pattern shape data in the bitmap format, and the data processing means comprising a function of rejecting an overlap area between patterns from pattern vertex data defining the pattern shape; and a function of generating the pattern shape data in the bitmap format based on the result of the overlap rejection function.

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