Exposure apparatus and exposure method

Details Exposure apparatus and exposure method Exposure apparatus and exposure method

2005-11-29

2005-11-29

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C356S401000

Reexamination Certificate

active

06970231

ABSTRACT:
An exposure method of projecting a pattern of an original onto a substrate. The method includes steps of measuring a position of an alignment mark formed on the substrate, projecting the pattern onto the substrate based on a measurement result in the measurement step, and projecting, onto the substrate based on the measurement result, a mark, which has a known relative position from a reference pattern arranged on an original stage and to align the original stage and a substrate stage, and is arranged on the original stage and to form an alignment mark on the substrate.

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patent: 10-242043 (1998-09-01), None

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