Exposure apparatus and exposure method

Details Exposure apparatus and exposure method Exposure apparatus and exposure method

1996-03-15

1997-04-01

Grimley, Arthur T.

Photocopying

Projection printing and copying cameras

Plural

355 53, 355 68, H01L 21027, G03B 2772

Patent

active

056171811

ABSTRACT:
An exposure apparatus and an exposure method for fabricating semiconductor devices or liquid crystal display boards. The scanning means synchronously moves the mask and the photosensitive substrate with respect to the plurality of projection optical systems, and patterns formed on the mask are projected onto the photosensitive substrate while images of mask formed by adjacent illumination optical systems are made overlapping with each other. On this occasion, the controlling means controls the light intensity changing means, and the light intensity changing means changes the intensity of a light beam of each illumination optical system, so that two intensities of overlapping parts in adjacent illumination areas become substantially equal to each other. The control by the controlling means is carried out based on the light intensities of the overlapping illumination areas as detected by the light intensity detecting means.

REFERENCES:
patent: 3887279 (1975-06-01), Rubin
patent: 3984187 (1976-10-01), Bestenreiner et al.
patent: 4264195 (1981-04-01), Tokuda et al.
patent: 4970546 (1990-11-01), Suzuki et al.
patent: 5343271 (1994-09-01), Morishige
patent: 5359389 (1994-10-01), Isohata

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