Exposure apparatus and exposure method

Photocopying – Projection printing and copying cameras – Step and repeat

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

355 77, 356401, G03B 2742

Patent

active

057344620

ABSTRACT:
An alignment method and apparatus is disclosed wherein, in one exposure process, alignment of a semiconductor substrate may be performed and, while moving the semiconductor substrate in a step-and-repeat manner in relation to shot positions on the semiconductor substrate, a pattern of an original may be printed on the semiconductor substrate at the respective shot position, wherein the one exposure process may be performed while using a plurality of placement data each specifying positions with respect to which the semiconductor substrate is to be positioned during the step-and-repeat motion.

REFERENCES:
patent: 4780617 (1988-10-01), Umatate et al.
patent: 4881100 (1989-11-01), Nakai et al.
patent: 5365051 (1994-11-01), Suzuki et al.
patent: 5561606 (1996-10-01), Ota et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Exposure apparatus and exposure method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus and exposure method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus and exposure method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-55987

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.