Exposure apparatus and exposure method

Details Exposure apparatus and exposure method Exposure apparatus and exposure method

1995-08-30

1998-03-31

Moses, R. L.

Photocopying

Projection printing and copying cameras

Step and repeat

355 77, 356401, G03B 2742

Patent

active

057344620

ABSTRACT:
An alignment method and apparatus is disclosed wherein, in one exposure process, alignment of a semiconductor substrate may be performed and, while moving the semiconductor substrate in a step-and-repeat manner in relation to shot positions on the semiconductor substrate, a pattern of an original may be printed on the semiconductor substrate at the respective shot position, wherein the one exposure process may be performed while using a plurality of placement data each specifying positions with respect to which the semiconductor substrate is to be positioned during the step-and-repeat motion.

REFERENCES:
patent: 4780617 (1988-10-01), Umatate et al.
patent: 4881100 (1989-11-01), Nakai et al.
patent: 5365051 (1994-11-01), Suzuki et al.
patent: 5561606 (1996-10-01), Ota et al.

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