Exposure apparatus and device manufacturing method using the...

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

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C250S492200

Reexamination Certificate

active

06891175

ABSTRACT:
A scanning exposure apparatus includes a master stage for scanning a master, a substrate stage for scanning a substrate, a transfer device for supplying/recovering the substrate to/from the substrate stage, a positioning device for relatively positioning the substrate and the master, and a scanning velocity determination device for determining a scanning velocity so as to maximize the number of substrates that can be exposed per unit time.

REFERENCES:
patent: 5621216 (1997-04-01), Clarke et al.
patent: 6100515 (2000-08-01), Nishi et al.
patent: 6538723 (2003-03-01), Hagiwara et al.
patent: 7-130626 (1995-05-01), None
patent: 10-223513 (1998-08-01), None
patent: 10-270345 (1998-10-01), None

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