Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2005-05-10
2005-05-10
Meier, Stephen D. (Department: 2853)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S492200
Reexamination Certificate
active
06891175
ABSTRACT:
A scanning exposure apparatus includes a master stage for scanning a master, a substrate stage for scanning a substrate, a transfer device for supplying/recovering the substrate to/from the substrate stage, a positioning device for relatively positioning the substrate and the master, and a scanning velocity determination device for determining a scanning velocity so as to maximize the number of substrates that can be exposed per unit time.
REFERENCES:
patent: 5621216 (1997-04-01), Clarke et al.
patent: 6100515 (2000-08-01), Nishi et al.
patent: 6538723 (2003-03-01), Hagiwara et al.
patent: 7-130626 (1995-05-01), None
patent: 10-223513 (1998-08-01), None
patent: 10-270345 (1998-10-01), None
Canon Kabushiki Kaisha
Dudding Alfred
Fitzpatrick ,Cella, Harper & Scinto
Meier Stephen D.
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