Exposure apparatus and device manufacturing method including...

Details Exposure apparatus and device manufacturing method including... Exposure apparatus and device manufacturing method including...

2005-11-22

2005-11-22

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S067000, C359S811000

Reexamination Certificate

active

06967706

ABSTRACT:
An exposure apparatus including an optical system having a first optical element, for directing light from a light source to a member to be exposed. The first optical element serves to separate first and second spaces inside the optical system, and the first optical element has a first notch formed at an end portion outside an effective light flux of light from the light source.

REFERENCES:
patent: 4690528 (1987-09-01), Tanimoto et al.
patent: 4704348 (1987-11-01), Koizumi et al.
patent: 4725126 (1988-02-01), Siga et al.
patent: 4786947 (1988-11-01), Kosugi et al.
patent: 4825247 (1989-04-01), Kemi et al.
patent: 5221822 (1993-06-01), Duny
patent: 5227605 (1993-07-01), Boudot et al.
patent: 5696623 (1997-12-01), Fujie et al.
patent: 5812242 (1998-09-01), Tokuda
patent: 5838426 (1998-11-01), Shinonaga et al.
patent: 5883704 (1999-03-01), Nishi et al.
patent: 6-216000 (1994-08-01), None

Affiliated with

Also associated with

Rating

Exposure apparatus and device manufacturing method including... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus and device manufacturing method including..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus and device manufacturing method including... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3483562