Exposure apparatus and device manufacturing method including...

Photocopying – Projection printing and copying cameras – With temperature or foreign particle control

Reexamination Certificate

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C355S053000, C359S620000

Reexamination Certificate

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06853439

ABSTRACT:
An exposure apparatus includes an illumination optical system for illuminating an original with ultraviolet light, a projection optical system for projecting a pattern of the original onto a substrate to be exposed and a gas purging means for replacing an inside space, which contains optical components of at least one of the illumination optical system and the projection optical system, with a gas having substantially no water content.

REFERENCES:
patent: 4690528 (1987-09-01), Tanimoto et al.
patent: 4704348 (1987-11-01), Koizumi et al.
patent: 4725126 (1988-02-01), Siga et al.
patent: 4786947 (1988-11-01), Kosugi et al.
patent: 4825247 (1989-04-01), Kemi et al.
patent: 5221822 (1993-06-01), Duny
patent: 5227605 (1993-07-01), Boudot et al.
patent: 5696623 (1997-12-01), Fujie et al.
patent: 5812242 (1998-09-01), Tokuda
patent: 5838426 (1998-11-01), Shinonaga et al.
patent: 5883704 (1999-03-01), Nishi et al.
patent: 6-216000 (1994-08-01), None

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