Photocopying – Projection printing and copying cameras – Illumination systems or details
Patent
1995-08-22
1997-11-04
Braun, Fred L.
Photocopying
Projection printing and copying cameras
Illumination systems or details
355 77, G03B 2742, G03B 2754
Patent
active
056845677
ABSTRACT:
An exposure apparatus includes a light source, first, second and third optical integrators disposed along an optical axis, for receiving light from the light source, each of the integrators having lens elements arrayed in a direction perpendicular to the optical axis, a first condensing optical system for directing, onto the third optical integrator, light passed through the first and second optical integrators, to form a secondary light source through the third optical integrator, a device for relatively shifting the second optical integrator relative to the first optical integrator, in the direction perpendicular to the optical axis, a second condensing optical system for receiving light from the secondary light source and directing the light to a mask, and a projection optical system for projecting an image of a pattern of the mask irradiated with the light from the secondary light source onto a substrate. Also disclosed are device manufacturing methods in which light, passed through first and second lens arrays, which are disposed along an optical axis, form a secondary light source and a device pattern is illuminated with light from the secondary light source whereby the device pattern is transferred to a substrate.
REFERENCES:
patent: 4497013 (1985-01-01), Ohta
patent: 4497015 (1985-01-01), Konno et al.
patent: 4498742 (1985-02-01), Uehara
patent: 4974919 (1990-12-01), Muraki et al.
patent: 4988188 (1991-01-01), Ohta
patent: 5016149 (1991-05-01), Tanaka et al.
patent: 5048926 (1991-09-01), Tanimoto
patent: 5153773 (1992-10-01), Muraki et al.
patent: 5305054 (1994-04-01), Susuki et al.
patent: 5499137 (1996-03-01), Shiraishi
Noguchi et al., "Subhalf Micron Lithography System with Phase-Shifting Effect", SPIE vol. 1674 Optical/Laser Microlithography V (1992), pp. 92-104.
Fukuda et al., "Nikkei Microdevices", Jul. 1990, pp. 108 through 114.
Braun Fred L.
Canon Kabushiki Kaisha
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