Exposure apparatus, and device manufacturing method

Photocopying – Projection printing and copying cameras – Detailed holder for photosensitive paper

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C355S053000

Reexamination Certificate

active

08077290

ABSTRACT:
An apparatus includes a stage configured to hold a substrate and to be moved, a measurement station including a measurement device configured to measure, with respect to each of a plurality of measurement points in a surface of the substrate held by the stage, a position of the surface, and an exposure station configured to expose the substrate to radiation while the stage is scanned, the stage being moved to the exposure station from the measurement station after the position of the surface is measured, and being scanned in the exposure station in accordance with the measured position of the surface, wherein the apparatus is configured to calculate a status concerning an error of a measurement value of the measurement device with respect to each of the plurality of measurement points based on outputs of the measurement device obtained with respect to the plurality of measurement points, and to set arrangement of the plurality of measurement points based on the calculated statuses.

REFERENCES:
patent: 6236447 (2001-05-01), Yamada et al.
patent: 1037117 (2000-09-01), None
patent: 04-124808 (1992-04-01), None
patent: 07-074088 (1995-03-01), None
patent: 11-195579 (1999-07-01), None
patent: 2000-323404 (2000-11-01), None
patent: 2003-007607 (2003-01-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Exposure apparatus, and device manufacturing method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Exposure apparatus, and device manufacturing method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Exposure apparatus, and device manufacturing method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4271159

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.