Exposure apparatus and device manufacturing method

Details Exposure apparatus and device manufacturing method Exposure apparatus and device manufacturing method

2008-04-07

2011-10-11

Nguyen, Hung Hnery (Department: 2882)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S035000, C355S053000, C355S067000, C359S229000

Reexamination Certificate

active

08035804

ABSTRACT:
A scanning exposure apparatus which exposes a substrate is disclosed. The apparatus comprises an illumination system configured to illuminate an illumination region of an original, a projection optical system configured to project a pattern of the original onto the substrate, and a stop configured to shield a flare generating component of flare light which travels from the projection optical system to the substrate, and to pass the remaining component of the flare light. An aperture of the stop has a shape different from a shape of the illumination region, and the aperture of the stop includes a portion whose dimension in a first direction parallel to a scanning direction of the substrate changes in accordance with a distance from the center of the aperture in a second direction perpendicular to the first direction.

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Japanese Office Action issued on Feb. 9, 2009 for Japanese Patent Application No. 2007-112295.

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