Exposure apparatus and device manufacturing method

Details Exposure apparatus and device manufacturing method Exposure apparatus and device manufacturing method

2008-03-20

2009-08-04

Nguyen, Hung Henry (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S055000

Reexamination Certificate

active

07570344

ABSTRACT:
An exposure apparatus which exposes a substrate via a liquid, comprises: a projection optical system configured to project a pattern of a reticle onto the substrate; a substrate stage configured to hold the substrate and move; a top plate which is arranged on the substrate stage and in which an opening is formed; and a measurement member which is arranged in the opening formed in the top plate arranged on the substrate stage, wherein a gap is formed between the top plate and the measurement member in a plane perpendicular to an optical axis of the projection optical system, and wherein the exposure apparatus satisfies the following formula: γ·cos θ1·L1+γ·cos θ2·L2+Pf·S<0.

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