Exposure apparatus and device manufacturing method

Photocopying – Projection printing and copying cameras – Detailed holder for original

Reexamination Certificate

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Details

C355S072000

Reexamination Certificate

active

07626683

ABSTRACT:
An exposure apparatus configured to expose a substrate to light to transfer a pattern of a reticle onto the substrate includes a reticle stage configured to mount the reticle, a structure configured to support the reticle stage, a plurality of first supporting members configured to support the structure; and a second supporting member configured to support the structure outside an area formed by connecting the three first supporting members. The second supporting member includes a unit configured to dampen vibration of the structure.

REFERENCES:
patent: 5579084 (1996-11-01), Takahashi et al.
patent: 5986743 (1999-11-01), Hanzawa
patent: 6327026 (2001-12-01), Wakui
patent: 6956222 (2005-10-01), Gilissen et al.
patent: 08-114250 (1996-05-01), None
patent: 11-153855 (1999-06-01), None
patent: 2001-044264 (2001-02-01), None
patent: 2004-078209 (2004-03-01), None
patent: 2004-158609 (2004-03-01), None

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